Scalable Fabrication of Nanostructured Materials and Devices, Volume II

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanofabrication and Nanomanufacturing".

Deadline for manuscript submissions: 20 July 2024 | Viewed by 742

Special Issue Editors


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Guest Editor
School of Chemical, Biological, and Environmental Engineering, Oregon State University, Corvallis, OR 97331, USA
Interests: process and chemical reaction engineering; scalable nanomanufacturing; multifunctional materials and devices; integrated chemical systems
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Guest Editor
Department of Chemical Engineering, Gyeongsang National University, **ju, Republic of Korea
Interests: nanomaterial processing development; rechargeable battery; nanostructured electronics
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Special Issue Information

Dear Colleagues,

Nanostructured materials consist of building elements with a characteristic length scale in the 1 to 100 nm range. The remarkable variations in material properties that occur as one progresses from a particle of material consisting of a countable number of atoms to bulk solids have opened up many exciting new opportunities. These opportunities span across the chemical, electrical, magnetic, mechanical, and optical field. Nanostructured materials have found a wide range of applications, such as chemical reactors, energy harvesters, micromechanical devices, nanoelectronics, microelectronics, nano-optics, nanophotonics, biomedical and environmental remediation applications. Scalable approaches to fabricate nanostructured materials and nanostructured-based devices are needed to translate these exciting innovations from the labs into the markets.

This Special Issue focuses on novel approaches to enable the scalable fabrication of nanostructured materials and nanostructured materials-based devices. Reviews of state-the-art developments and original reports of experimental and modeling works are welcome.

Prof. Dr. Chih-Hung Chang
Prof. Dr. Chang-Ho Choi
Guest Editors

Manuscript Submission Information

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Keywords

  • scalable nanomanufacturing
  • nanostructured electronics
  • multifunctional materials and devices
  • inkjet printing
  • integrated chemical systems

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Published Papers (1 paper)

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Research

11 pages, 6000 KiB  
Article
Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy
by Yujie Zhan, Liangui Deng, Wei Dai, Yongxue Qiu, Shicheng Sun, Dizhi Sun, Bowen Hu and Jianguo Guan
Nanomaterials 2024, 14(12), 998; https://doi.org/10.3390/nano14120998 - 8 Jun 2024
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Abstract
Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. [...] Read more.
Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro–nano optics, flexible electronics, optical communication, and biomedicine studies. Full article
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